Method used for obtaining highly pure silicon used as a semiconductor material, is

Question

Method used for obtaining highly pure silicon used as a semiconductor material, is (A) Oxidation (B) Electrochemical (C) Crystallization (D) Zone refining

Tardigrade Admin · Accepted Answer

Si obtained by reduction of SiCl4 with H2 is further purified by zone refining method to get Si of very high purity. Silicon is purified by zone-refining process because the impurities present in it are more soluble in the liquid phase than in the solid phase.

Q. Method used for obtaining highly pure silicon used as a semiconductor material, is

Oxidation

Electrochemical

Crystallization

Zone refining

Si obtained by reduction of $S i C l_{4}$ with $H_{2}$ is further purified by zone refining method to get Si of very high purity. Silicon is purified by zone-refining process because the impurities present in it are more soluble in the liquid phase than in the solid phase.

Q. Method used for obtaining highly pure silicon used as a semiconductor material, is

Oxidation

Electrochemical

Crystallization

Zone refining

Si obtained by reduction of SiCl4​ with H2​ is further purified by zone refining method to get Si of very high purity. Silicon is purified by zone-refining process because the impurities present in it are more soluble in the liquid phase than in the solid phase.

Si obtained by reduction of $S i C l_{4}$ with $H_{2}$ is further purified by zone refining method to get Si of very high purity. Silicon is purified by zone-refining process because the impurities present in it are more soluble in the liquid phase than in the solid phase.