Q. Pure silicon at 300 K has equal electron (n$_e$) and hole (n$_h$) concentration of $1.5 \times 10^{16} m^{-3}$. Doping by indium increases $n_h$ to $4.5 \times 10^{22}m^{-3}$ The $n_e $ in the doped silicon is
AMUAMU 2009Semiconductor Electronics: Materials Devices and Simple Circuits
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